Fabrication of gate-all-around integrated circuit structures having common metal gates and having gate dielectrics with a dipole layer

ABSTRACT

Gate-all-around integrated circuit structures having common metal gates and having gate dielectrics with a dipole layer are described. For example, an integrated circuit structure includes a first vertical arrangement of horizontal nanowires, and a second vertical arrangement of horizontal nanowires. A first gate stack is over the first vertical arrangement of horizontal nanowires, the first gate stack a PMOS gate stack having a P-type conductive layer on a first gate dielectric including a high-k dielectric layer on a first dipole material layer. A second gate stack is over the second vertical arrangement of horizontal nanowires, the second gate stack an NMOS gate stack having the P-type conductive layer on a second gate dielectric including the high-k dielectric layer on a second dipole material layer.

TECHNICAL FIELD

Embodiments of the disclosure are in the field of integrated circuitstructures and processing and, in particular, gate-all-around integratedcircuit structures having common metal gates and having gate dielectricswith a dipole layer.

BACKGROUND

For the past several decades, the scaling of features in integratedcircuits has been a driving force behind an ever-growing semiconductorindustry. Scaling to smaller and smaller features enables increaseddensities of functional units on the limited real estate ofsemiconductor chips. For example, shrinking transistor size allows forthe incorporation of an increased number of memory or logic devices on achip, lending to the fabrication of products with increased capacity.The drive for ever-more capacity, however, is not without issue. Thenecessity to optimize the performance of each device becomesincreasingly significant.

In the manufacture of integrated circuit devices, multi-gatetransistors, such as tri-gate transistors, have become more prevalent asdevice dimensions continue to scale down. In conventional processes,tri-gate transistors are generally fabricated on either bulk siliconsubstrates or silicon-on-insulator substrates. In some instances, bulksilicon substrates are preferred due to their lower cost and becausethey enable a less complicated tri-gate fabrication process. In anotheraspect, maintaining mobility improvement and short channel control asmicroelectronic device dimensions scale below the 10 nanometer (nm) nodeprovides a challenge in device fabrication. Nanowires used to fabricatedevices provide improved short channel control.

Scaling multi-gate and nanowire transistors has not been withoutconsequence, however. As the dimensions of these fundamental buildingblocks of microelectronic circuitry are reduced and as the sheer numberof fundamental building blocks fabricated in a given region isincreased, the constraints on the lithographic processes used to patternthese building blocks have become overwhelming. In particular, there maybe a trade-off between the smallest dimension of a feature patterned ina semiconductor stack (the critical dimension) and the spacing betweensuch features.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1A illustrates a cross-sectional view of a gate-all-aroundintegrated circuit structure having common metal gates and having gatedielectrics with a dipole layer, in accordance with an embodiment of thepresent disclosure.

FIG. 1B illustrates a cross-sectional view of a gate-all-aroundintegrated circuit structure having common metal gates and having gatedielectrics with a dipole layer, in accordance with an embodiment of thepresent disclosure.

FIG. 2 illustrates a cross-sectional view of an operation in a method offabricating a gate-all-around integrated circuit structure having commonmetal gates, in accordance with an embodiment of the present disclosure.

FIG. 3 illustrates cross-sectional views in a gate stack representingvarious operations in a method of fabricating an integrated circuitstructure having a dipole layer used to tune the threshold voltage ofthe gate stack, in accordance with an embodiment of the presentdisclosure.

FIGS. 4A-4J illustrates cross-sectional views of various operations in amethod of fabricating a gate-all-around integrated circuit structure, inaccordance with an embodiment of the present disclosure.

FIG. 5 illustrates a cross-sectional view of a non-planar integratedcircuit structure as taken along a gate line, in accordance with anembodiment of the present disclosure.

FIG. 6 illustrates cross-sectional views taken through nanowires andfins for a non-endcap architecture (left-hand side (a)) versus aself-aligned gate endcap (SAGE) architecture (right-hand side (b)), inaccordance with an embodiment of the present disclosure.

FIG. 7 illustrates cross-sectional views representing various operationsin a method of fabricating a self-aligned gate endcap (SAGE) structurewith gate-all-around devices, in accordance with an embodiment of thepresent disclosure.

FIG. 8A illustrates a three-dimensional cross-sectional view of ananowire-based integrated circuit structure, in accordance with anembodiment of the present disclosure.

FIG. 8B illustrates a cross-sectional source or drain view of thenanowire-based integrated circuit structure of FIG. 8A, as taken alongthe a-a′ axis, in accordance with an embodiment of the presentdisclosure.

FIG. 8C illustrates a cross-sectional channel view of the nanowire-basedintegrated circuit structure of FIG. 8A, as taken along the b-b′ axis,in accordance with an embodiment of the present disclosure.

FIG. 9 illustrates a computing device in accordance with oneimplementation of an embodiment of the disclosure.

FIG. 10 illustrates an interposer that includes one or more embodimentsof the disclosure.

DESCRIPTION OF THE EMBODIMENTS

Gate-all-around integrated circuit structures having common metal gatesand having gate dielectrics with a dipole layer are described. In thefollowing description, numerous specific details are set forth, such asspecific integration and material regimes, in order to provide athorough understanding of embodiments of the present disclosure. It willbe apparent to one skilled in the art that embodiments of the presentdisclosure may be practiced without these specific details. In otherinstances, well-known features, such as integrated circuit designlayouts, are not described in detail in order to not unnecessarilyobscure embodiments of the present disclosure. Furthermore, it is to beappreciated that the various embodiments shown in the Figures areillustrative representations and are not necessarily drawn to scale.

Certain terminology may also be used in the following description forthe purpose of reference only, and thus are not intended to be limiting.For example, terms such as “upper”, “lower”, “above”, and “below” referto directions in the drawings to which reference is made. Terms such as“front”, “back”, “rear”, and “side” describe the orientation and/orlocation of portions of the component within a consistent but arbitraryframe of reference which is made clear by reference to the text and theassociated drawings describing the component under discussion. Suchterminology may include the words specifically mentioned above,derivatives thereof, and words of similar import.

Embodiments described herein may be directed to front-end-of-line (FEOL)semiconductor processing and structures. FEOL is the first portion ofintegrated circuit (IC) fabrication where the individual devices (e.g.,transistors, capacitors, resistors, etc.) are patterned in thesemiconductor substrate or layer. FEOL generally covers everything up to(but not including) the deposition of metal interconnect layers.Following the last FEOL operation, the result is typically a wafer withisolated transistors (e.g., without any wires).

Embodiments described herein may be directed to back-end of line (BEOL)semiconductor processing and structures. BEOL is the second portion ofIC fabrication where the individual devices (e.g., transistors,capacitors, resistors, etc.) are interconnected with wiring on thewafer, e.g., the metallization layer or layers. BEOL includes contacts,insulating layers (dielectrics), metal levels, and bonding sites forchip-to-package connections. In the BEOL part of the fabrication stagecontacts (pads), interconnect wires, vias and dielectric structures areformed. For modern IC processes, more than 10 metal layers may be addedin the BEOL.

Embodiments described below may be applicable to FEOL processing andstructures, BEOL processing and structures, or both FEOL and BEOLprocessing and structures. In particular, although an exemplaryprocessing scheme may be illustrated using a FEOL processing scenario,such approaches may also be applicable to BEOL processing. Likewise,although an exemplary processing scheme may be illustrated using a BEOLprocessing scenario, such approaches may also be applicable to FEOLprocessing.

One or more embodiments described herein are directed to gate all arounddevices fabricated using a common metal gate flow. One or moreembodiments described herein are directed to gate all around dipolemulti-VT metal gate patterning. Particular embodiments are directed togate all around metal gate pattering using only dipole subtractive flowmasks and only one work function metal. It is to be appreciated that,unless indicated otherwise, reference to nanowires can indicatenanowires or nanoribbons.

It is to be appreciated that modern CMOS technologies require multipleVT (Multi-VT) device flavors in both NMOS and PMOS. However, theMulti-VT requirement can render the overall metal gate (MG) flow longer,more complicated and more expensive because of the increased number ofmasks and processing operations. Embodiments described herein may beimplemented to address such issues.

To provide context, a subtractive metal gate (SMG) flow has been thesemiconductor industry's approach since Intel's pioneering 45 nm HiKMetal Gate process. In a standard SMG flow, a work function metal (WFM)thin film is first deposited on an entire wafer, subsequently patternedusing a hard mask (HM), and then removed/subtracted in OPEN patternedareas using an isotropic wet etch. While SMG works very well for planarand FinFET transistors, it nonetheless can break down for a Gate AllAround (GAA) architecture. The GAA unique architecture renders theisotropic wet etch bias (WEB) of the subtracted/removed metal too largefor ensuring minimum N-P boundary conditions. In GAA, the WFM layer canmerge in between the nano-ribbons (NR). Etching the merged metal canrequire using very aggressive wet chemistries and/or long etch times.The result inadvertently creates a very large creep/undercut under thehardmask (HM) which fails to protect the WFM in the BLOCK area anylonger. The large isotropic WEB in the BLOCK region can render in turnthe N-P boundary as very wide which can adversely affect the ability todeliver high transistor density for GAA architecture.

In accordance with one or more embodiments of the present disclosure,addressing issues outlined above, approaches are described forimplementing a common metal gate rather than a subtractive metal gate(SMG) flow approach. For GAA, the common metal gate flow avoids thedifficult isotropic wet etch removal of merged WFM in between NR and itsassociated large WEB issues that are part of standard SMG flow. In anembodiment, a common metal gate approach enables tight N-P boundary andhigh transistor density for GAA architectures.

To provide further context, dipoles can be used to set the thresholdvoltage and to enable relative thinning of workfunction metal layers.Embodiments may be implemented to set a threshold voltage (VT) by usinga thin layer of dipole, thereby replacing thicker workfunction metalsused in state-of-the-art scaled devices. Embodiments may provide amulti-VT solution and also provide ultra-low VT with a relativelythinner workfunction metal.

In previous approaches, a one-gate/mask patterning processing scheme isusing a standard subtractive metal gate flow (SMGF) to fabricate a sixvoltage threshold (6VT) structure such as a 3VTP and 3VTN (3P3N)structure with a minimum of five masks where each mask patterns a singlegate type. However, using one mask for patterning each gate type canrender the multi-VT process longer, more complicated and overall morecostly. Additionally, multiple masks/operations can expose gatematerials such as high-k (HiK) materials and/or gate spacer materials tomultiple dry/wet etch patterning chemistries that can weaken theirstructural integrity and decreases the overall reliability of thedevice. Other approaches may include additive workfunction metal flowshaving a signature wall at the N-P boundary which may inadvertentlyincrease the tightest possible N-P boundary by the amount of theworkfunction metal (WFM) thickness which may render the N-P boundarynon-optimal.

In accordance with embodiments described herein, approaches involvingthe use of separate dipoles, only dipole subtractive metal gate flow(SMGF) masks and a single WFM are described. For a 6VT (e.g., 3P3N)structure, embodiments can involve (A) PMOS is first patterned with adipole SMGF Mask1 and Mask2 using an N-type Dipole1 that has a lower VTshift efficiency of, e.g., 20-40 mV/A. NMOS is then patterned with adipole SMGF Mask3, Mask4 and Mask5 using a separate N-type Dipole2 thathas a stronger VT shift efficiency, e.g., greater than 100-120 mV/A.Subsequently, a PWFM is deposited on both PMOS and NMOS. NMOS VT isestablished by the second N-type dipole strength even if theworkfunction metal (WFM) is P-type; or (B) the use of only 3 Masks,where both PMOS and NMOS are first simultaneously patterned by a dipoleSMGF Mask1 (dual dipole) and Mask2 (quad dipole) using an N-type Dipole1that has a lower VT shift efficiency but symmetrical VT shift for NMOSand PMOS. The NMOS is then patterned with a dipole SMGF Mask3 using anN-type Dipole2 that has a higher VT shift efficiency. Finally, a singlePWFM is deposited on both PMOS and NMOS. It is to be appreciated thatdipole drive anneals can be performed either separately for the firstand second dipole, or at the same time.

In a first example, FIG. 1A illustrates a cross-sectional view of agate-all-around integrated circuit structure having common metal gatesand having gate dielectrics with a dipole layer, in accordance with anembodiment of the present disclosure.

Referring to FIG. 1A, an integrated circuit structure 100 includes aP-type region 104 and an N-type region 106 over a substrate 102.

The P-type region 104 includes a low-VT P-type device (P-LVT) 104A, astandard-VT P-type device (P-SVT) 104B, and a high-VT P-type device(P-HVT) 104C. The devices 104A, 104B and 104C each include a pluralityof horizontal nanowires or nanoribbons 108 surrounded by a correspondinggate dielectric 112A, 112B or 112C, respectively. Gate dielectric 112Adoes not include a dipole layer, gate dielectric 112B includes a singledelta VT (1×ΔVT) first-type N-type dipole layer (1×ND1), and gatedielectric 112C includes a double delta VT (2×ΔVT) first-type N-typedipole layer (2×ND1). A P-type conductive layer 116A surrounds thenanowires 108.

The N-type region 106 includes a low-VT P-type device (N-LVT) 106A, astandard-VT N-type device (N-SVT) 106B, and a high-VT N-type device(N-HVT) 106C. The devices 106A, 106B and 106C each include a pluralityof horizontal nanowires or nanoribbons 110 surrounded by a correspondinggate dielectric 114A, 114B or 114C, respectively. Gate dielectric 114Cincludes a second-type N-type dipole layer active concentration2(1×ND2AC2), gate dielectric 114B includes a single delta VT (−1×ΔVT)second-type N-type dipole layer active concentration1 (1×ND2AC1) plus asecond-type N-type dipole layer active concentration2 (1×ND2AC2), andgate dielectric 114A includes a double delta VT (−2×ΔVT) second-typeN-type dipole layer active concentration1 (2×ND2AC1) plus a second-typeN-type dipole layer active concentration2 (1×ND2AC2). A P-typeconductive layer 116B surrounds the nanowires 110. The high activeconcentration2 of the second-type N-type dipole layer (ND2AC2) issetting the N-type character in the N-type region 106 even though thework function metal 116B is P-type. A high dipole active concentrationis achieved with a thicker dipole layer. The low active concentration1of the second-type N-type dipole layer (ND2AC1) is helping setting deltaVT between N-LVT 106A, N-SVT 106B and N-HVT 106C devices. A low dipoleactive concentration is achieved with a thinner dipole layer. In anembodiment, the P-type conductive layer 116B is continuous with theP-type conductive layer 116A in the P-type region 104.

In an embodiment, integrated circuit structure 100 is fabricated using afirst mask 120 for performing a subtractive metal gate flow (SMGF),applied to ND1. A second mask 122 is for performing a subtractive metalgate flow (SMGF), also applied to ND1. A third mask 124 is forperforming a subtractive metal gate flow (SMGF), applied to ND2. Afourth mask 126 is for performing a subtractive metal gate flow (SMGF),also applied to ND2. A fifth mask 128 is for performing a subtractivemetal gate flow (SMGF), also applied to ND2.

In a second example, FIG. 1B illustrates a cross-sectional view of agate-all-around integrated circuit structure having common metal gatesand having gate dielectrics with a dipole layer, in accordance with anembodiment of the present disclosure.

Referring to FIG. 1B, an integrated circuit structure 130 includes aP-type region 134 and an N-type region 136 over a substrate 132.

The P-type region 134 includes a low-VT P-type device (P-LVT) 134A, astandard-VT P-type device (P-SVT) 134B, and a high-VT P-type device(P-HVT) 134C. The devices 134A, 134B and 134C each include a pluralityof horizontal nanowires or nanoribbons 138 surrounded by a correspondinggate dielectric 142A, 142B or 142C, respectively. Gate dielectric 142Adoes not include a dipole layer, gate dielectric 142B includes a singledelta VT (+1×ΔVT) first-type N-type dipole layer (1×ND1), and gatedielectric 142C includes a double delta VT (+2×ΔVT) first-type N-typedipole layer (2×ND1). A P-type conductive layer 146A surrounds thenanowires 138.

The N-type region 136 includes a low-VT P-type device (N-LVT) 136A, astandard-VT N-type device (N-SVT) 136B, and a high-VT N-type device(N-HVT) 136C. The devices 136A, 136B and 136C each include a pluralityof horizontal nanowires or nanoribbons 140 surrounded by a correspondinggate dielectric 144A, 144B or 144C, respectively. Gate dielectric 144Cincludes a second-type N-type dipole layer (1×ND2), gate dielectric 144Bincludes a single delta VT (−1×ΔVT) first-type N-type dipole layer(1×ND1) plus a second-type N-type dipole layer (1×ND2), and gatedielectric 144A includes a double delta VT (−2×ΔVT) first-type N-typedipole layer (2×ND1) plus a second-type N-type dipole layer (1×ND2). AP-type conductive layer 146B surrounds the nanowires 140. Thesecond-type N-type dipole layer (ND2) is setting the N-type character inthe N-type region 136 even though the work function metal 146B isP-type. The first-type N-type dipole layer (ND1) is helping settingdelta VT between N-LVT 136A, N-SVT 136B and N-HVT 136C devices. In anembodiment, the P-type conductive layer 146B is continuous with theP-type conductive layer 146A in the P-type region 134.

In an embodiment, integrated circuit structure 130 is fabricated using afirst mask 150 for performing a subtractive metal gate flow (SMGF),applied to ND1. A second mask 152 is for performing a subtractive metalgate flow (SMGF), also applied to ND1. A third mask 154 is forperforming a subtractive metal gate flow (SMGF), applied to ND2.

It is to be appreciated that for a 3P3N patterning scheme used tofabricate the structures of FIGS. 1A and 1B, embodiments may beimplemented to avoid large N-P boundaries associated with etching aworkfunction metal (WFM) in between nano-ribbons and may avoid adding toa WFM wall thickness at the N-P boundary. Thus, embodiment scan beimplemented to enable the tightest possible N-P boundary design for thehighest GAA transistor density. By using a reduced number of masks togenerate a 3P3N gate all around multi-VT device, implementation ofembodiments described herein can reduce flow complexity, the number ofprocess operations, and metal gate (MG) loops costs. Also, the overallnumber of patterning and etch operations that otherwise attack the gatematerials can be reduced and ultimately increase the general reliabilityof the fabricated devices.

With reference generally to FIGS. 1A and 1B, in accordance with anembodiment of the present disclosure, an integrated circuit structureincludes a first vertical arrangement of horizontal nanowires, and asecond vertical arrangement of horizontal nanowires. A first gate stackis over the first vertical arrangement of horizontal nanowires, thefirst gate stack a PMOS gate stack having a P-type conductive layer on afirst gate dielectric including a high-k dielectric layer on a firstdipole material layer. A second gate stack is over the second verticalarrangement of horizontal nanowires, the second gate stack an NMOS gatestack having the P-type conductive layer on a second gate dielectricincluding the high-k dielectric layer on a second dipole material layer.

In an embodiment, the high-k dielectric layer is an HfO₂ layer. In anembodiment, the first dipole layer includes a material selected from thegroup consisting of Al₂O₃, TiO₂, ZrO₂, HfO₂, La₂O₃, Y₂O₃, MgO, SrO andLu₂O₃, and the second dipole layer includes a material selected from thegroup consisting of Al₂O₃, TiO₂, ZrO₂, HfO₂, La₂O₃, Y₂O₃, MgO, SrO andLu₂O₃. In an embodiment, one of the first or the second dipole layer hasa thickness in the range of 1-3 Angstroms. In an embodiment, one of thefirst or the second dipole layer has a thickness in the range of 4-6Angstroms. In an embodiment, the P-type conductive layer is continuousbetween the first gate stack and the second gate stack.

With reference generally to FIGS. 1A and 1B, in accordance with anembodiment of the present disclosure, an integrated circuit structureincludes a first vertical arrangement of horizontal nanowires, a secondvertical arrangement of horizontal nanowires, and a third verticalarrangement of horizontal nanowires. A first gate stack is over thefirst vertical arrangement of horizontal nanowires, the first gate stacka first NMOS gate stack having a P-type conductive layer on a first gatedielectric including a high-k dielectric layer on a first dipolematerial layer. A second gate stack is over the second verticalarrangement of horizontal nanowires, the second gate stack a second NMOSgate stack having the P-type conductive layer on a second gatedielectric including the high-k dielectric layer on a second dipolematerial layer. A third gate stack is over the second verticalarrangement of horizontal nanowires, the third gate stack a third NMOSgate stack having the P-type conductive layer on a third gate dielectricincluding the high-k dielectric layer and no dipole material layer.

In an embodiment, the high-k dielectric layer is an HfO₂ layer. In anembodiment, the first and second dipole layers include a materialselected from the group consisting of La₂O₃, Y₂O₃, MgO, SrO and Lu₂O₃.In an embodiment, the first dipole layer has a thickness in the range of1-3 Angstroms, and the second dipole layer has a thickness in the rangeof 4-6 Angstroms. In an embodiment, the P-type conductive layer iscontinuous between the first NMOS gate stack and the second NMOS gatestack, and is continuous between the second NMOS gate stack and thethird NMOS gate stack.

In an embodiment, gates of the same polarity may have no dipole, 1×dipole or 2× dipole. Similar patterning schemes may be extended usingTwo P-type Dipoles of different Strengths and just one NWFM. Similarpatterning schemes may be extended but not limited to 4P4N using onlyfour masks (FIG. 1B approach) or seven masks (FIG. 1A approach), orextended to 5P5N, etc.

In an embodiment, a common metal gate process flow is used as a finaloperation of a metal gate after multi-VT patterning process has beencompleted. A common metal gate process may be used either for N-typeworkfunction metal (N-WFM) or P-type workfunction metal (P-WFM), eventhough P-WFM is the focus of at least some of the embodiments describedherein. After common metal gate processing is complete, both N-type andP-type gate stacks may be subsequently blanket deposited with a gatefill metal.

As an exemplary intermediate structure in a common metal gate processflow, FIG. 2 illustrates a cross-sectional view of an operation in amethod of fabricating a gate-all-around integrated circuit structurehaving common metal gates, in accordance with an embodiment of thepresent disclosure.

Referring to FIG. 2, a method of fabricating an integrated circuitstructure includes a starting structure 200 including a PMOS region 204and an NMOS region 206 above a substrate 202. The PMOS region 204includes a first plurality of horizontal nanowires 208 (which can benanoribbons). The NMOS region 206 includes a second plurality ofhorizontal nanowires 210 (which can be nanoribbons). A first gatedielectric 209 surrounds nanowires of the first plurality of horizontalnanowires 208. A second gate dielectric layer 211 that also containssecond type N-type dipole layer (ND2) surrounds nanowires of the secondplurality of horizontal nanowires 210. The PMOS region 204 and the NMOSregion 206 are included in a trench in a dielectric layer 212. A P-typeconductive layer 214 is in both the PMOS region 204 and the NMOS region206. The P-type conductive layer 214 surrounds the nanowires 208 of thefirst plurality of horizontal nanowires 208, and also surrounds thenanowires 210 of the second plurality of horizontal nanowires 210. Thesecond-type N-type dipole layer (ND2) in 211 is setting the N-typecharacter in the N-type region 206 even though the work function metal214 is P-type. Although not depicted, a conductive fill can then beformed over the structure of FIG. 2. It is to be appreciated that thePMOS (or P-type) and NMOS (or N-type) designated features may bereversed as NMOS (or N-type) and PMOS (or P-type) designated features,respectively.

With reference again to FIG. 2, in accordance with an embodiment of thepresent disclosure, an integrated circuit structure includes a firstvertical arrangement of horizontal nanowires 208, and a second verticalarrangement of horizontal nanowires 210. A first gate stack is over thefirst vertical arrangement of horizontal nanowires 208 (e.g., in region204), the first gate stack a PMOS gate stack including a first portionof a P-type conductive layer 214 surrounding the nanowires of the firstvertical arrangement of horizontal nanowires 208. A second gate stack isover the second vertical arrangement of horizontal nanowires 210 (e.g.,in region 206), the second gate stack an NMOS gate stack including asecond portion of the P-type conductive layer 214 surrounding thenanowires of the first vertical arrangement of horizontal nanowires 210.

In an embodiment, the integrated circuit structure further includes afirst pair of epitaxial source or drain structures at first and secondends of the first vertical arrangement of horizontal nanowires 208, anda second pair of epitaxial source or drain structures at first andsecond ends of the second vertical arrangement of horizontal nanowires210, examples of which are described in greater detail below. In oneembodiment, a first pair of conductive contacts is on the first pair ofepitaxial source or drain structures, and a second pair of conductivecontacts is on the second pair of epitaxial source or drain structures,examples of which are described in greater detail below. In oneembodiment, the first and second pairs of epitaxial source or drainstructures are first and second pairs of non-discrete epitaxial sourceor drain structures, examples of which are described in greater detailbelow. In one embodiment, the first and second pairs of epitaxial sourceor drain structures are first and second pairs of discrete epitaxialsource or drain structures, examples of which are described in greaterdetail below.

In another exemplary fabrication scheme, FIG. 3 illustratescross-sectional views in a gate stack representing various operations ina method of fabricating an integrated circuit structure having a dipolelayer used to tune the threshold voltage of the gate stack, inaccordance with an embodiment of the present disclosure.

Referring to part (i) of FIG. 3, a method of fabricating an integratedcircuit structure includes forming a starting structure 300 including anamorphous oxide layer 304, such as an SiO₂ layer, on a semiconductorchannel structure 302. A trench 306, such as a trench formed during areplacement gate scheme exposes the amorphous oxide layer 304.

Referring to part (ii) of FIG. 3, a high-k dielectric layer 308 isformed in the trench 306 and on the amorphous oxide layer 304.

Referring to part (iii) of FIG. 3, a material layer 310 is formed in thetrench 306 and on the high-k dielectric layer 308.

Referring to part (iv) of FIG. 3, the material layer 310 and the high-kdielectric layer 308 are annealed to form a gate dielectric over thesemiconductor channel structure 302. The gate dielectric includes thehigh-k dielectric layer 308 on a dipole material layer 310A. The dipolematerial layer 310A is distinct from the high-k dielectric layer 308.

Referring to part (v) of FIG. 3, a workfunction layer 312 is formed inthe trench 306 and on the high-k dielectric layer 308. The workfunctionlayer 312 includes a metal.

Referring to part (vi) of FIG. 3, a gate stack is formed by forming agate stressor layer 314 on the workfunction layer 312.

With reference again to FIG. 3, in accordance with an embodiment of thepresent disclosure, a high-k metal gate process is initiated afterspacer formation and epitaxial deposition in front end flow. In themetal gate loop, a layer of chemical oxide 304 is formed during wetcleans. The layer can also or instead be thermally grown to improve theinterface quality. A layer of high-k oxide 308 with higher dielectricconstant is then deposited on the underlying chemical oxide layer 304. Adipole layer 310 is then deposited by an atomic layer depositiontechnique. The gate stack is then subjected to high anneal temperatureduring which the dipole 310 diffuses through the underlying highpermittivity oxide layer 308 to form a net dipole 310A at the high-k308/chemical oxide 304 interface. The process is understood as beingeffected due to the difference in the electro-negativities of high-k andthe chemical oxide layer. Subsequently, workfunction metals 312 aredeposited, followed by a gate stressor 314 to increase channel stress.

With reference again to part (vi) of FIG. 3, in accordance with anembodiment of the present disclosure, an integrated circuit structureincludes a semiconductor channel structure 302 including amonocrystalline material. A gate dielectric is over the semiconductorchannel structure 302. The gate dielectric includes a high-k dielectriclayer 308 on a dipole material layer 310A. The dipole material layer310A is distinct from the high-k dielectric layer 308. A gate electrodehas a workfunction layer 312 on the high-k dielectric layer 308. Theworkfunction layer 312 includes a metal. As described in exemplaryembodiments below, a first source or drain structure is at a first sideof the gate electrode, and a second source or drain structure is at asecond side of the gate electrode opposite the first side.

In an embodiment, the high-k dielectric layer 308 is an HfO₂ layer. Inone such embodiment, the gate electrode is an N-type gate electrode, andthe dipole layer 310A includes a material selected from the groupconsisting of Al₂O₃, TiO₂, and ZrO₂. In another such embodiment, thegate electrode is a P-type gate electrode, and the dipole layer 310Aincludes a material selected from the group consisting of La₂O₃, Y₂O₃,MgO, SrO and Lu₂O₃. In an embodiment, the dipole layer 310A has athickness in the range of 1-3 Angstroms. In an embodiment, the gateelectrode is a Mid Gap-type gate electrode and the dipole layer 310Aincludes a material selected from the group consisting of Al₂O₃, TiO₂,ZrO₂, HfO₂, La₂O₃, Y₂O₃, MgO, SrO and Lu₂O₃.

In an embodiment, the gate electrode further includes a gate stressorlayer 314 on the workfunction layer 312. In one such embodiment, thegate electrode is an N-type gate electrode, and the gate stressor layer314 includes a metal selected from the group consisting of W, Ti, Mn, Crand Al. In another such embodiment, the gate electrode is a P-type gateelectrode, and the gate stressor layer 314 includes a metal selectedfrom the group consisting of Ti, Ta, Sn and Zr.

In an embodiment, the gate dielectric further includes an amorphousoxide layer 304 between the dipole material layer 310A and thesemiconductor channel structure 302. In one such embodiment, theamorphous oxide layer 304 is an SiO₂ layer.

In accordance with an embodiment of the present disclosure, dipolelayers of different thicknesses are used to tune the threshold voltageand thus provide a multi-threshold voltage solution for scaled logictransistors. It is to be appreciated that the embodiments describedherein can also include other implementations such as nanowires and/ornanoribbons with various widths, thicknesses and/or materials includingbut not limited to Si and SiGe. For example, group III-V materials maybe used.

It is to be appreciated that, in a particular embodiment, nanowires ornanoribbons, or sacrificial intervening layers, may be composed ofsilicon. As used throughout, a silicon layer may be used to describe asilicon material composed of a very substantial amount of, if not all,silicon. However, it is to be appreciated that, practically, 100% pureSi may be difficult to form and, hence, could include a tiny percentageof carbon, germanium or tin. Such impurities may be included as anunavoidable impurity or component during deposition of Si or may“contaminate” the Si upon diffusion during post deposition processing.As such, embodiments described herein directed to a silicon layer mayinclude a silicon layer that contains a relatively small amount, e.g.,“impurity” level, non-Si atoms or species, such as Ge, C or Sn. It is tobe appreciated that a silicon layer as described herein may be undopedor may be doped with dopant atoms such as boron, phosphorous or arsenic.

It is to be appreciated that, in a particular embodiment, nanowires ornanoribbons, or sacrificial intervening layers, may be composed ofsilicon germanium. As used throughout, a silicon germanium layer may beused to describe a silicon germanium material composed of substantialportions of both silicon and germanium, such as at least 5% of both. Insome embodiments, the amount of germanium is greater than the amount ofsilicon. In particular embodiments, a silicon germanium layer includesapproximately 60% germanium and approximately 40% silicon (Si₄₀Ge₆₀). Inother embodiments, the amount of silicon is greater than the amount ofgermanium. In particular embodiments, a silicon germanium layer includesapproximately 30% germanium and approximately 70% silicon (Si₇₀Ge₃₀). Itis to be appreciated that, practically, 100% pure silicon germanium(referred to generally as SiGe) may be difficult to form and, hence,could include a tiny percentage of carbon or tin. Such impurities may beincluded as an unavoidable impurity or component during deposition ofSiGe or may “contaminate” the SiGe upon diffusion during post depositionprocessing. As such, embodiments described herein directed to a silicongermanium layer may include a silicon germanium layer that contains arelatively small amount, e.g., “impurity” level, non-Ge and non-Si atomsor species, such as carbon or tin. It is to be appreciated that asilicon germanium layer as described herein may be undoped or may bedoped with dopant atoms such as boron, phosphorous or arsenic.

Described below are various devices and processing schemes that may beused to fabricate a device that can be integrated with a common metalgate and with a gate dielectric with a dipole layer. It is to beappreciated that the exemplary embodiments need not necessarily requireall features described, or may include more features than are described.For example, nanowire release processing may be performed through areplacement gate trench. Examples of such release processes aredescribed below. Additionally, in yet another aspect, backend (BE)interconnect scaling can result in lower performance and highermanufacturing cost due to patterning complexity. Embodiments describedherein may be implemented to enable front-side and back-sideinterconnect integration for nanowire transistors. Embodiments describedherein may provide an approach to achieve a relatively widerinterconnect pitch. The result may be improved product performance andlower patterning costs. Embodiments may be implemented to enable robustfunctionality of scaled nanowire or nanoribbon transistors with lowpower and high performance.

One or more embodiments described herein are directed dual epitaxial(EPI) connections for nanowire or nanoribbon transistors using partialsource or drain (SD) and asymmetric trench contact (TCN) depth. In anembodiment, an integrated circuit structure is fabricated by formingsource-drain openings of nanowire/nanoribbon transistors which arepartially filled with SD epitaxy. A remainder of the opening is filledwith a conductive material. Deep trench formation on one of the sourceor drain side enables direct contact to a back-side interconnect level.

As an exemplary process flow for fabricating a gate-all-around device ofa gate-all-around integrated circuit structure, FIGS. 4A-4J illustratescross-sectional views of various operations in a method of fabricating agate-all-around integrated circuit structure, in accordance with anembodiment of the present disclosure.

Referring to FIG. 4A, a method of fabricating an integrated circuitstructure includes forming a starting stack which includes alternatingsacrificial layers 404 and nanowires 406 above a fin 402, such as asilicon fin. The nanowires 406 may be referred to as a verticalarrangement of nanowires. A protective cap 408 may be formed above thealternating sacrificial layers 404 and nanowires 406, as is depicted. Arelaxed buffer layer 452 and a defect modification layer 450 may beformed beneath the alternating sacrificial layers 404 and nanowires 406,as is also depicted.

Referring to FIG. 4B, a gate stack 410 is formed over the verticalarrangement of horizontal nanowires 406. Portions of the verticalarrangement of horizontal nanowires 406 are then released by removingportions of the sacrificial layers 404 to provide recessed sacrificiallayers 404′ and cavities 412, as is depicted in FIG. 4C.

It is to be appreciated that the structure of FIG. 4C may be fabricatedto completion without first performing the deep etch and asymmetriccontact processing described below. In either case (e.g., with orwithout asymmetric contact processing), in an embodiment, a fabricationprocess involves use of a process scheme that provides a gate-all-aroundintegrated circuit structure having epitaxial nubs, which may bevertically discrete source or drain structures.

Referring to FIG. 4D, upper gate spacers 414 are formed at sidewalls ofthe gate structure 410. Cavity spacers 416 are formed in the cavities412 beneath the upper gate spacers 414. A deep trench contact etch isthen optionally performed to form trenches 418 and to form recessednanowires 406′. A patterned relaxed buffer layer 452′ and a patterneddefect modification layer 450′ may also be present, as is depicted.

A sacrificial material 420 is then formed in the trenches 418, as isdepicted in FIG. 4E. In other process schemes, an isolated trench bottomor silicon trench bottom may be used.

Referring to FIG. 4F, a first epitaxial source or drain structure (e.g.,left-hand features 422) is formed at a first end of the verticalarrangement of horizontal nanowires 406′. A second epitaxial source ordrain structure (e.g., right-hand features 422) is formed at a secondend of the vertical arrangement of horizontal nanowires 406′. In anembodiment, as depicted, the epitaxial source or drain structures 422are vertically discrete source or drain structures and may be referredto as epitaxial nubs.

An inter-layer dielectric (ILD) material 424 is then formed at the sidesof the gate electrode 410 and adjacent the source or drain structures422, as is depicted in FIG. 4G. Referring to FIG. 4H, a replacement gateprocess is used to form a permanent gate dielectric 428 and a permanentgate electrode 426. The ILD material 424 is then removed, as is depictedin FIG. 4I. The sacrificial material 420 is then removed from one of thesource drain locations (e.g., right-hand side) to form trench 432, butis not removed from the other of the source drain locations to formtrench 430.

Referring to FIG. 4J, a first conductive contact structure 434 is formedcoupled to the first epitaxial source or drain structure (e.g.,left-hand features 422). A second conductive contact structure 436 isformed coupled to the second epitaxial source or drain structure (e.g.,right-hand features 422). The second conductive contact structure 436 isformed deeper along the fin 402 than the first conductive contactstructure 434. In an embodiment, although not depicted in FIG. 4J, themethod further includes forming an exposed surface of the secondconductive contact structure 436 at a bottom of the fin 402. Conductivecontacts may include a contact resistance reducing layer and a primarycontact electrode layer, where examples can include Ti, Ni, Co (for theformer and W, Ru, Co for the latter.)

In an embodiment, the second conductive contact structure 436 is deeperalong the fin 402 than the first conductive contact structure 434, as isdepicted. In one such embodiment, the first conductive contact structure434 is not along the fin 402, as is depicted. In another suchembodiment, not depicted, the first conductive contact structure 434 ispartially along the fin 402.

In an embodiment, the second conductive contact structure 436 is alongan entirety of the fin 402. In an embodiment, although not depicted, inthe case that the bottom of the fin 402 is exposed by a back-sidesubstrate removal process, the second conductive contact structure 436has an exposed surface at a bottom of the fin 402.

In an embodiment, the structure of FIG. 4J, or related structures ofFIGS. 4A-4J, is formed using a common metal gate and a gate dielectricdipole layer approach, such as described in association with FIGS. 1A,1B, 2 and 3.

In another aspect, in order to enable access to both conductive contactstructures of a pair of asymmetric source and drain contact structures,integrated circuit structures described herein may be fabricated using aback-side reveal of front-side structures fabrication approach. In someexemplary embodiments, reveal of the back-side of a transistor or otherdevice structure entails wafer-level back-side processing. In contrastto a conventional TSV-type technology, a reveal of the back-side of atransistor as described herein may be performed at the density of thedevice cells, and even within sub-regions of a device. Furthermore, sucha reveal of the back-side of a transistor may be performed to removesubstantially all of a donor substrate upon which a device layer wasdisposed during front-side device processing. As such, a microns-deepTSV becomes unnecessary with the thickness of semiconductor in thedevice cells following a reveal of the back-side of a transistorpotentially being only tens or hundreds of nanometers.

Reveal techniques described herein may enable a paradigm shift from“bottom-up” device fabrication to “center-out” fabrication, where the“center” is any layer that is employed in front-side fabrication,revealed from the back-side, and again employed in back-sidefabrication. Processing of both a front-side and revealed back-side of adevice structure may address many of the challenges associated withfabricating 3D ICs when primarily relying on front-side processing.

A reveal of the back-side of a transistor approach may be employed forexample to remove at least a portion of a carrier layer and interveninglayer of a donor-host substrate assembly. The process flow begins withan input of a donor-host substrate assembly. A thickness of a carrierlayer in the donor-host substrate is polished (e.g., CMP) and/or etchedwith a wet or dry (e.g., plasma) etch process. Any grind, polish, and/orwet/dry etch process known to be suitable for the composition of thecarrier layer may be employed. For example, where the carrier layer is agroup IV semiconductor (e.g., silicon) a CMP slurry known to be suitablefor thinning the semiconductor may be employed. Likewise, any wetetchant or plasma etch process known to be suitable for thinning thegroup IV semiconductor may also be employed.

In some embodiments, the above is preceded by cleaving the carrier layeralong a fracture plane substantially parallel to the intervening layer.The cleaving or fracture process may be utilized to remove a substantialportion of the carrier layer as a bulk mass, reducing the polish or etchtime needed to remove the carrier layer. For example, where a carrierlayer is 400-900 μm in thickness, 100-700 μm may be cleaved off bypracticing any blanket implant known to promote a wafer-level fracture.In some exemplary embodiments, a light element (e.g., H, He, or Li) isimplanted to a uniform target depth within the carrier layer where thefracture plane is desired. Following such a cleaving process, thethickness of the carrier layer remaining in the donor-host substrateassembly may then be polished or etched to complete removal.Alternatively, where the carrier layer is not fractured, the grind,polish and/or etch operation may be employed to remove a greaterthickness of the carrier layer.

Next, exposure of an intervening layer is detected. Detection is used toidentify a point when the back-side surface of the donor substrate hasadvanced to nearly the device layer. Any endpoint detection techniqueknown to be suitable for detecting a transition between the materialsemployed for the carrier layer and the intervening layer may bepracticed. In some embodiments, one or more endpoint criteria are basedon detecting a change in optical absorbance or emission of the back-sidesurface of the donor substrate during the polishing or etchingperformance. In some other embodiments, the endpoint criteria areassociated with a change in optical absorbance or emission of byproductsduring the polishing or etching of the donor substrate back-sidesurface. For example, absorbance or emission wavelengths associated withthe carrier layer etch byproducts may change as a function of thedifferent compositions of the carrier layer and intervening layer. Inother embodiments, the endpoint criteria are associated with a change inmass of species in byproducts of polishing or etching the back-sidesurface of the donor substrate. For example, the byproducts ofprocessing may be sampled through a quadrupole mass analyzer and achange in the species mass may be correlated to the differentcompositions of the carrier layer and intervening layer. In anotherexemplary embodiment, the endpoint criteria is associated with a changein friction between a back-side surface of the donor substrate and apolishing surface in contact with the back-side surface of the donorsubstrate.

Detection of the intervening layer may be enhanced where the removalprocess is selective to the carrier layer relative to the interveninglayer as non-uniformity in the carrier removal process may be mitigatedby an etch rate delta between the carrier layer and intervening layer.Detection may even be skipped if the grind, polish and/or etch operationremoves the intervening layer at a rate sufficiently below the rate atwhich the carrier layer is removed. If an endpoint criteria is notemployed, a grind, polish and/or etch operation of a predetermined fixedduration may stop on the intervening layer material if the thickness ofthe intervening layer is sufficient for the selectivity of the etch. Insome examples, the carrier etch rate: intervening layer etch rate is3:1-10:1, or more.

Upon exposing the intervening layer, at least a portion of theintervening layer may be removed. For example, one or more componentlayers of the intervening layer may be removed. A thickness of theintervening layer may be removed uniformly by a polish, for example.Alternatively, a thickness of the intervening layer may be removed witha masked or blanket etch process. The process may employ the same polishor etch process as that employed to thin the carrier, or may be adistinct process with distinct process parameters. For example, wherethe intervening layer provides an etch stop for the carrier removalprocess, the latter operation may employ a different polish or etchprocess that favors removal of the intervening layer over removal of thedevice layer. Where less than a few hundred nanometers of interveninglayer thickness is to be removed, the removal process may be relativelyslow, optimized for across-wafer uniformity, and more preciselycontrolled than that employed for removal of the carrier layer. A CMPprocess employed may, for example employ a slurry that offers very highselectively (e.g., 100:1-300:1, or more) between semiconductor (e.g.,silicon) and dielectric material (e.g., SiO) surrounding the devicelayer and embedded within the intervening layer, for example, aselectrical isolation between adjacent device regions.

For embodiments where the device layer is revealed through completeremoval of the intervening layer, back-side processing may commence onan exposed back-side of the device layer or specific device regionsthere in. In some embodiments, the back-side device layer processingincludes a further polish or wet/dry etch through a thickness of thedevice layer disposed between the intervening layer and a device regionpreviously fabricated in the device layer, such as a source or drainregion.

In some embodiments where the carrier layer, intervening layer, ordevice layer back-side is recessed with a wet and/or plasma etch, suchan etch may be a patterned etch or a materially selective etch thatimparts significant non-planarity or topography into the device layerback-side surface. As described further below, the patterning may bewithin a device cell (i.e., “intra-cell” patterning) or may be acrossdevice cells (i.e., “inter-cell” patterning). In some patterned etchembodiments, at least a partial thickness of the intervening layer isemployed as a hard mask for back-side device layer patterning. Hence, amasked etch process may preface a correspondingly masked device layeretch.

The above described processing scheme may result in a donor-hostsubstrate assembly that includes IC devices that have a back-side of anintervening layer, a back-side of the device layer, and/or back-side ofone or more semiconductor regions within the device layer, and/orfront-side metallization revealed. Additional back-side processing ofany of these revealed regions may then be performed during downstreamprocessing.

It is to be appreciated that the structures resulting from the aboveexemplary processing schemes may be used in a same or similar form forsubsequent processing operations to complete device fabrication, such asPMOS and/or NMOS device fabrication. As an example of a completeddevice, FIG. 5 illustrates a cross-sectional view of a non-planarintegrated circuit structure as taken along a gate line, in accordancewith an embodiment of the present disclosure.

Referring to FIG. 5, a semiconductor structure or device 500 includes anon-planar active region (e.g., a fin structure including protruding finportion 504 and sub-fin region 505) within a trench isolation region506. In an embodiment, instead of a solid fin, the non-planar activeregion is separated into nanowires (such as nanowires 504A and 504B)above sub-fin region 505, as is represented by the dashed lines. Ineither case, for ease of description for non-planar integrated circuitstructure 500, a non-planar active region 504 is referenced below as aprotruding fin portion. In an embodiment, the sub-fin region 505 alsoincludes a relaxed buffer layer 542 and a defect modification layer 540,as is depicted.

A gate line 508 is disposed over the protruding portions 504 of thenon-planar active region (including, if applicable, surroundingnanowires 504A and 504B), as well as over a portion of the trenchisolation region 506. As shown, gate line 508 includes a gate electrode550 and a gate dielectric layer 552. In one embodiment, gate line 508may also include a dielectric cap layer 554. A gate contact 514, andoverlying gate contact via 516 are also seen from this perspective,along with an overlying metal interconnect 560, all of which aredisposed in inter-layer dielectric stacks or layers 570. Also seen fromthe perspective of FIG. 5, the gate contact 514 is, in one embodiment,disposed over trench isolation region 506, but not over the non-planaractive regions. In another embodiment, the gate contact 514 is over thenon-planar active regions.

In an embodiment, the semiconductor structure or device 500 is anon-planar device such as, but not limited to, a fin-FET device, atri-gate device, a nanoribbon device, or a nanowire device. In such anembodiment, a corresponding semiconducting channel region is composed ofor is formed in a three-dimensional body. In one such embodiment, thegate electrode stacks of gate lines 508 surround at least a top surfaceand a pair of sidewalls of the three-dimensional body.

As is also depicted in FIG. 5, in an embodiment, an interface 580 existsbetween a protruding fin portion 504 and sub-fin region 505. Theinterface 580 can be a transition region between a doped sub-fin region505 and a lightly or undoped upper fin portion 504. In one suchembodiment, each fin is approximately 10 nanometers wide or less, andsub-fin dopants are optionally supplied from an adjacent solid statedoping layer at the sub-fin location. In a particular such embodiment,each fin is less than 10 nanometers wide.

Although not depicted in FIG. 5, it is to be appreciated that source ordrain regions of or adjacent to the protruding fin portions 504 are oneither side of the gate line 508, i.e., into and out of the page. In oneembodiment, the material of the protruding fin portions 504 in thesource or drain locations is removed and replaced with anothersemiconductor material, e.g., by epitaxial deposition to form epitaxialsource or drain structures. The source or drain regions may extend belowthe height of dielectric layer of trench isolation region 506, i.e.,into the sub-fin region 505. In accordance with an embodiment of thepresent disclosure, the more heavily doped sub-fin regions, i.e., thedoped portions of the fins below interface 580, inhibits source to drainleakage through this portion of the bulk semiconductor fins. In anembodiment, the source and drain regions have associated asymmetricsource and drain contact structures, as described above in associationwith FIG. 4J.

With reference again to FIG. 5, in an embodiment, fins 504/505 (and,possibly nanowires 504A and 504B) are composed of a crystalline silicongermanium layer which may be doped with a charge carrier, such as butnot limited to phosphorus, arsenic, boron, gallium or a combinationthereof.

In an embodiment, trench isolation region 506, and trench isolationregions (trench isolations structures or trench isolation layers)described throughout, may be composed of a material suitable toultimately electrically isolate, or contribute to the isolation of,portions of a permanent gate structure from an underlying bulk substrateor isolate active regions formed within an underlying bulk substrate,such as isolating fin active regions. For example, in one embodiment,trench isolation region 506 is composed of a dielectric material suchas, but not limited to, silicon dioxide, silicon oxy-nitride, siliconnitride, or carbon-doped silicon nitride.

Gate line 508 may be composed of a gate electrode stack which includes agate dielectric layer 552 and a gate electrode layer 550. In anembodiment, the gate electrode of the gate electrode stack is composedof a metal gate and the gate dielectric layer is composed of a high-kmaterial. For example, in one embodiment, the gate dielectric layer 552is composed of a material such as, but not limited to, hafnium oxide,hafnium oxy-nitride, hafnium silicate, lanthanum oxide, zirconium oxide,zirconium silicate, tantalum oxide, barium strontium titanate, bariumtitanate, strontium titanate, yttrium oxide, aluminum oxide, leadscandium tantalum oxide, lead zinc niobate, or a combination thereof.Furthermore, a portion of gate dielectric layer 552 may include a layerof native oxide formed from the top few layers of the substrate fin 504.In an embodiment, the gate dielectric layer 552 is composed of a tophigh-k portion and a lower portion composed of an oxide of asemiconductor material. In one embodiment, the gate dielectric layer 552is composed of a top portion of hafnium oxide and a bottom portion ofsilicon dioxide or silicon oxy-nitride. In some implementations, aportion of the gate dielectric is a “U”-shaped structure that includes abottom portion substantially parallel to the surface of the substrateand two sidewall portions that are substantially perpendicular to thetop surface of the substrate.

In one embodiment, the gate electrode layer 550 is composed of a metallayer such as, but not limited to, metal nitrides, metal carbides, metalsilicides, metal aluminides, hafnium, zirconium, titanium, tantalum,aluminum, ruthenium, palladium, platinum, cobalt, nickel or conductivemetal oxides. In a specific embodiment, the gate electrode layer 550 iscomposed of a non-workfunction-setting fill material formed above ametal workfunction-setting layer. The gate electrode layer 550 mayconsist of a P-type workfunction metal or an N-type workfunction metal,depending on whether the transistor is to be a PMOS or an NMOStransistor. In some implementations, the gate electrode layer 550 mayconsist of a stack of two or more metal layers, where one or more metallayers are workfunction metal layers and at least one metal layer is aconductive fill layer. For a PMOS transistor, metals that may be usedfor the gate electrode include, but are not limited to, ruthenium,palladium, platinum, cobalt, nickel, tungsten and conductive metaloxides, e.g., ruthenium oxide. A P-type metal layer will enable theformation of a PMOS gate electrode with a workfunction that is betweenabout 4.9 eV and about 5.2 eV. For an NMOS transistor, metals that maybe used for the gate electrode include, but are not limited to, hafnium,zirconium, titanium, tantalum, aluminum, alloys of these metals, andcarbides of these metals such as hafnium carbide, zirconium carbide,titanium carbide, tantalum carbide, and aluminum carbide. An N-typemetal layer will enable the formation of an NMOS gate electrode with aworkfunction that is between about 3.9 eV and about 4.2 eV. In someimplementations, the gate electrode may consist of a “U”-shapedstructure that includes a bottom portion substantially parallel to thesurface of the substrate and two sidewall portions that aresubstantially perpendicular to the top surface of the substrate. Inanother implementation, at least one of the metal layers that form thegate electrode may simply be a planar layer that is substantiallyparallel to the top surface of the substrate and does not includesidewall portions substantially perpendicular to the top surface of thesubstrate. In further implementations of the disclosure, the gateelectrode may consist of a combination of U-shaped structures andplanar, non-U-shaped structures. For example, the gate electrode mayconsist of one or more U-shaped metal layers formed atop one or moreplanar, non-U-shaped layers.

Spacers associated with the gate electrode stacks may be composed of amaterial suitable to ultimately electrically isolate, or contribute tothe isolation of, a permanent gate structure from adjacent conductivecontacts, such as self-aligned contacts. For example, in one embodiment,the spacers are composed of a dielectric material such as, but notlimited to, silicon dioxide, silicon oxy-nitride, silicon nitride, orcarbon-doped silicon nitride.

Gate contact 514 and overlying gate contact via 516 may be composed of aconductive material. In an embodiment, one or more of the contacts orvias are composed of a metal species. The metal species may be a puremetal, such as tungsten, nickel, or cobalt, or may be an alloy such as ametal-metal alloy or a metal-semiconductor alloy (e.g., such as asilicide material).

In an embodiment (although not shown), a contact pattern which isessentially perfectly aligned to an existing gate pattern 508 is formedwhile eliminating the use of a lithographic step with exceedingly tightregistration budget. In an embodiment, the contact pattern is avertically symmetric contact pattern, or an asymmetric contact patternsuch as described in association with FIG. 4J. In other embodiments, allcontacts are front-side connected and are not asymmetric. In one suchembodiment, the self-aligned approach enables the use of intrinsicallyhighly selective wet etching (e.g., versus conventionally implementeddry or plasma etching) to generate contact openings. In an embodiment, acontact pattern is formed by utilizing an existing gate pattern incombination with a contact plug lithography operation. In one suchembodiment, the approach enables elimination of the need for anotherwise critical lithography operation to generate a contact pattern,as used in conventional approaches. In an embodiment, a trench contactgrid is not separately patterned, but is rather formed between poly(gate) lines. For example, in one such embodiment, a trench contact gridis formed subsequent to gate grating patterning but prior to gategrating cuts.

In an embodiment, providing structure 500 involves fabrication of thegate stack structure 508 by a replacement gate process. In such ascheme, dummy gate material such as polysilicon or silicon nitridepillar material, may be removed and replaced with permanent gateelectrode material. In one such embodiment, a permanent gate dielectriclayer is also formed in this process, as opposed to being carriedthrough from earlier processing. In an embodiment, dummy gates areremoved by a dry etch or wet etch process. In one embodiment, dummygates are composed of polycrystalline silicon or amorphous silicon andare removed with a dry etch process including use of SF₆. In anotherembodiment, dummy gates are composed of polycrystalline silicon oramorphous silicon and are removed with a wet etch process including useof aqueous NH₄OH or tetramethylammonium hydroxide. In one embodiment,dummy gates are composed of silicon nitride and are removed with a wetetch including aqueous phosphoric acid.

Referring again to FIG. 5, the arrangement of semiconductor structure ordevice 500 places the gate contact over isolation regions. Such anarrangement may be viewed as inefficient use of layout space. In anotherembodiment, however, a semiconductor device has contact structures thatcontact portions of a gate electrode formed over an active region, e.g.,over a fin 505, and in a same layer as a trench contact via.

In an embodiment, the structure of FIG. 5 is formed using a common metalgate and a gate dielectric dipole layer approach, such as described inassociation with FIGS. 1A, 1B, 2 and 3.

It is to be appreciated that not all aspects of the processes describedabove need be practiced to fall within the spirit and scope ofembodiments of the present disclosure. Also, the processes describedherein may be used to fabricate one or a plurality of semiconductordevices. The semiconductor devices may be transistors or like devices.For example, in an embodiment, the semiconductor devices are ametal-oxide semiconductor (MOS) transistors for logic or memory, or arebipolar transistors. Also, in an embodiment, the semiconductor deviceshave a three-dimensional architecture, such as a nanowire device, ananoribbon device, a tri-gate device, an independently accessed doublegate device, or a FIN-FET. One or more embodiments may be particularlyuseful for fabricating semiconductor devices at a sub-10 nanometer (10nm) technology node.

In an embodiment, as used throughout the present description, interlayerdielectric (ILD) material is composed of or includes a layer of adielectric or insulating material. Examples of suitable dielectricmaterials include, but are not limited to, oxides of silicon (e.g.,silicon dioxide (SiO₂)), doped oxides of silicon, fluorinated oxides ofsilicon, carbon doped oxides of silicon, various low-k dielectricmaterials known in the arts, and combinations thereof. The interlayerdielectric material may be formed by conventional techniques, such as,for example, chemical vapor deposition (CVD), physical vapor deposition(PVD), or by other deposition methods.

In an embodiment, as is also used throughout the present description,metal lines or interconnect line material (and via material) is composedof one or more metal or other conductive structures. A common example isthe use of copper lines and structures that may or may not includebarrier layers between the copper and surrounding ILD material. As usedherein, the term metal includes alloys, stacks, and other combinationsof multiple metals. For example, the metal interconnect lines mayinclude barrier layers (e.g., layers including one or more of Ta, TaN,Ti or TiN), stacks of different metals or alloys, etc. Thus, theinterconnect lines may be a single material layer, or may be formed fromseveral layers, including conductive liner layers and fill layers. Anysuitable deposition process, such as electroplating, chemical vapordeposition or physical vapor deposition, may be used to forminterconnect lines. In an embodiment, the interconnect lines arecomposed of a conductive material such as, but not limited to, Cu, Al,Ti, Zr, Hf, V, Ru, Co, Ni, Pd, Pt, W, Ag, Au or alloys thereof. Theinterconnect lines are also sometimes referred to in the art as traces,wires, lines, metal, or simply interconnect.

In an embodiment, as is also used throughout the present description,hardmask materials, capping layers, or plugs are composed of dielectricmaterials different from the interlayer dielectric material. In oneembodiment, different hardmask, capping or plug materials may be used indifferent regions so as to provide different growth or etch selectivityto each other and to the underlying dielectric and metal layers. In someembodiments, a hardmask layer, capping or plug layer includes a layer ofa nitride of silicon (e.g., silicon nitride) or a layer of an oxide ofsilicon, or both, or a combination thereof. Other suitable materials mayinclude carbon-based materials. Other hardmask, capping or plug layersknown in the arts may be used depending upon the particularimplementation. The hardmask, capping or plug layers maybe formed byCVD, PVD, or by other deposition methods.

In an embodiment, as is also used throughout the present description,lithographic operations are performed using 193 nm immersion lithography(i193), EUV and/or EBDW lithography, or the like. A positive tone or anegative tone resist may be used. In one embodiment, a lithographic maskis a trilayer mask composed of a topographic masking portion, ananti-reflective coating (ARC) layer, and a photoresist layer. In aparticular such embodiment, the topographic masking portion is a carbonhardmask (CHM) layer and the anti-reflective coating layer is a siliconARC layer.

In another aspect, one or more embodiments are directed to neighboringsemiconductor structures or devices separated by self-aligned gateendcap (SAGE) structures. Particular embodiments may be directed tointegration of multiple width (multi-Wsi) nanowires and nanoribbons in aSAGE architecture and separated by a SAGE wall. In an embodiment,nanowires/nanoribbons are integrated with multiple Wsi in a SAGEarchitecture portion of a front-end process flow. Such a process flowmay involve integration of nanowires and nanoribbons of different Wsi toprovide robust functionality of next generation transistors with lowpower and high performance. Associated epitaxial source or drain regionsmay be embedded (e.g., portions of nanowires removed and then source ordrain (S/D) growth is performed).

To provide further context, advantages of a self-aligned gate endcap(SAGE) architecture may include the enabling of higher layout densityand, in particular, scaling of diffusion to diffusion spacing. Toprovide illustrative comparison, FIG. 6 illustrates cross-sectionalviews taken through nanowires and fins for a non-endcap architecture(left-hand side (a)) versus a self-aligned gate endcap (SAGE)architecture (right-hand side (b)), in accordance with an embodiment ofthe present disclosure.

Referring to the left-hand side (a) of FIG. 6, an integrated circuitstructure 600 includes a substrate 602 having fins 604 protruding therefrom by an amount 606 above an isolation structure 608 laterallysurrounding lower portions of the fins 604. Upper portions of the finsmay include a relaxed buffer layer 622 and a defect modification layer620, as is depicted. Corresponding nanowires 605 are over the fins 604.A gate structure may be formed over the integrated circuit structure 600to fabricate a device. However, breaks in such a gate structure may beaccommodated for by increasing the spacing between fin 604/nanowire 605pairs.

By contrast, referring to the right-hand side (b) of FIG. 6, anintegrated circuit structure 650 includes a substrate 652 having fins654 protruding therefrom by an amount 656 above an isolation structure658 laterally surrounding lower portions of the fins 654. Upper portionsof the fins may include a relaxed buffer layer 672 and a defectmodification layer 670, as is depicted. Corresponding nanowires 655 areover the fins 654. Isolating SAGE walls 660 (which may include ahardmask thereon, as depicted) are included within the isolationstructure 652 and between adjacent fin 654/nanowire 655 pairs. Thedistance between an isolating SAGE wall 660 and a nearest fin654/nanowire 655 pair defines the gate endcap spacing 662. A gatestructure may be formed over the integrated circuit structure 600,between insolating SAGE walls to fabricate a device. Breaks in such agate structure are imposed by the isolating SAGE walls. Since theisolating SAGE walls 660 are self-aligned, restrictions fromconventional approaches can be minimized to enable more aggressivediffusion to diffusion spacing. Furthermore, since gate structuresinclude breaks at all locations, individual gate structure portions maybe layer connected by local interconnects formed over the isolating SAGEwalls 660. In an embodiment, as depicted, the SAGE walls 660 eachinclude a lower dielectric portion and a dielectric cap on the lowerdielectric portion. In accordance with an embodiment of the presentdisclosure, a fabrication process for structures associated with FIG. 6involves use of a process scheme that provides a gate-all-aroundintegrated circuit structure having epitaxial source or drainstructures.

In an embodiment, the structure of part (b) of FIG. 6 is formed using acommon metal gate and a gate dielectric dipole layer approach, such asdescribed in association with FIGS. 1A, 1B, 2 and 3.

A self-aligned gate endcap (SAGE) processing scheme involves theformation of gate/trench contact endcaps self-aligned to fins withoutrequiring an extra length to account for mask mis-registration. Thus,embodiments may be implemented to enable shrinking of transistor layoutarea. Embodiments described herein may involve the fabrication of gateendcap isolation structures, which may also be referred to as gatewalls, isolation gate walls or self-aligned gate endcap (SAGE) walls.

In an exemplary processing scheme for structures having SAGE wallsseparating neighboring devices, FIG. 7 illustrate cross-sectional viewsrepresenting various operations in a method of fabricating aself-aligned gate endcap (SAGE) structure with gate-all-around devices,in accordance with an embodiment of the present disclosure.

Referring to part (a) of FIG. 7, a starting structure includes ananowire patterning stack 704 above a substrate 702. A lithographicpatterning stack 706 is formed above the nanowire patterning stack 704.The nanowire patterning stack 704 includes alternating sacrificiallayers 710 and nanowire layers 712, which may be above a relaxed bufferlayer 782 and a defect modification layer 780, as is depicted. Aprotective mask 714 is between the nanowire patterning stack 704 and thelithographic patterning stack 706. In one embodiment, the lithographicpatterning stack 706 is trilayer mask composed of a topographic maskingportion 720, an anti-reflective coating (ARC) layer 722, and aphotoresist layer 724. In a particular such embodiment, the topographicmasking portion 720 is a carbon hardmask (CHM) layer and theanti-reflective coating layer 722 is a silicon ARC layer.

Referring to part (b) of FIG. 7, the stack of part (a) islithographically patterned and then etched to provide an etchedstructure including a patterned substrate 702 and trenches 730.

Referring to part (c) of FIG. 7, the structure of part (b) has anisolation layer 740 and a SAGE material 742 formed in trenches 730. Thestructure is then planarized to leave patterned topographic maskinglayer 720′ as an exposed upper layer.

Referring to part (d) of FIG. 7, the isolation layer 740 is recessedbelow an upper surface of the patterned substrate 702, e.g., to define aprotruding fin portion and to provide a trench isolation structure 741beneath SAGE walls 742.

Referring to part (e) of FIG. 7, the sacrificial layers 710 are removedat least in the channel region to release nanowires 712A and 712B.Subsequent to the formation of the structure of part (e) of FIG. 7, agate stacks may be formed around nanowires 712B or 712A, over protrudingfins of substrate 702, and between SAGE walls 742. In one embodiment,prior to formation of the gate stacks, the remaining portion ofprotective mask 714 is removed. In another embodiment, the remainingportion of protective mask 714 is retained as an insulating fin hat asan artifact of the processing scheme.

Referring again to part (e) of FIG. 7, it is to be appreciated that achannel view is depicted, with source or drain regions being locatinginto and out of the page. In an embodiment, the channel region includingnanowires 712B has a width less than the channel region includingnanowires 712A. Thus, in an embodiment, an integrated circuit structureincludes multiple width (multi-Wsi) nanowires. Although structures of712B and 712A may be differentiated as nanowires and nanoribbons,respectively, both such structures are typically referred to herein asnanowires. It is also to be appreciated that reference to or depictionof a fin/nanowire pair throughout may refer to a structure including afin and one or more overlying nanowires (e.g., two overlying nanowiresare shown in FIG. 7). In accordance with an embodiment of the presentdisclosure, a fabrication process for structures associated with FIG. 7involves use of a process scheme that provides a gate-all-aroundintegrated circuit structure having epitaxial source or drainstructures.

In an embodiment, the structure of part (e) FIG. 7 is formed using acommon metal gate and a gate dielectric dipole layer approach, such asdescribed in association with FIGS. 1A, 1B, 2 and 3.

In an embodiment, as described throughout, self-aligned gate endcap(SAGE) isolation structures may be composed of a material or materialssuitable to ultimately electrically isolate, or contribute to theisolation of, portions of permanent gate structures from one another.Exemplary materials or material combinations include a single materialstructure such as silicon dioxide, silicon oxy-nitride, silicon nitride,or carbon-doped silicon nitride. Other exemplary materials or materialcombinations include a multi-layer stack having lower portion silicondioxide, silicon oxy-nitride, silicon nitride, or carbon-doped siliconnitride and an upper portion higher dielectric constant material such ashafnium oxide.

To highlight an exemplary integrated circuit structure having threevertically arranged nanowires, FIG. 8A illustrates a three-dimensionalcross-sectional view of a nanowire-based integrated circuit structure,in accordance with an embodiment of the present disclosure. FIG. 8Billustrates a cross-sectional source or drain view of the nanowire-basedintegrated circuit structure of FIG. 8A, as taken along the a-a′ axis.FIG. 8C illustrates a cross-sectional channel view of the nanowire-basedintegrated circuit structure of FIG. 8A, as taken along the b-b′ axis.

Referring to FIG. 8A, an integrated circuit structure 800 includes oneor more vertically stacked nanowires (804 set) above a substrate 802. Inan embodiment, as depicted, a relaxed buffer layer 802C, a defectmodification layer 802B, and a lower substrate portion 802A are includedin substrate 802, as is depicted. An optional fin below the bottommostnanowire and formed from the substrate 802 is not depicted for the sakeof emphasizing the nanowire portion for illustrative purposes.Embodiments herein are targeted at both single wire devices and multiplewire devices. As an example, a three nanowire-based devices havingnanowires 804A, 804B and 804C is shown for illustrative purposes. Forconvenience of description, nanowire 804A is used as an example wheredescription is focused on one of the nanowires. It is to be appreciatedthat where attributes of one nanowire are described, embodiments basedon a plurality of nanowires may have the same or essentially the sameattributes for each of the nanowires.

Each of the nanowires 804 includes a channel region 806 in the nanowire.The channel region 806 has a length (L). Referring to FIG. 8C, thechannel region also has a perimeter (Pc) orthogonal to the length (L).Referring to both FIGS. 8A and 8C, a gate electrode stack 808 surroundsthe entire perimeter (Pc) of each of the channel regions 806. The gateelectrode stack 808 includes a gate electrode along with a gatedielectric layer between the channel region 806 and the gate electrode(not shown). In an embodiment, the channel region is discrete in that itis completely surrounded by the gate electrode stack 808 without anyintervening material such as underlying substrate material or overlyingchannel fabrication materials. Accordingly, in embodiments having aplurality of nanowires 804, the channel regions 806 of the nanowires arealso discrete relative to one another.

Referring to both FIGS. 8A and 8B, integrated circuit structure 800includes a pair of non-discrete source or drain regions 810/812. Thepair of non-discrete source or drain regions 810/812 is on either sideof the channel regions 806 of the plurality of vertically stackednanowires 804. Furthermore, the pair of non-discrete source or drainregions 810/812 is adjoining for the channel regions 806 of theplurality of vertically stacked nanowires 804. In one such embodiment,not depicted, the pair of non-discrete source or drain regions 810/812is directly vertically adjoining for the channel regions 806 in thatepitaxial growth is on and between nanowire portions extending beyondthe channel regions 806, where nanowire ends are shown within the sourceor drain structures. In another embodiment, as depicted in FIG. 8A, thepair of non-discrete source or drain regions 810/812 is indirectlyvertically adjoining for the channel regions 806 in that they are formedat the ends of the nanowires and not between the nanowires.

In an embodiment, as depicted, the source or drain regions 810/812 arenon-discrete in that there are not individual and discrete source ordrain regions for each channel region 806 of a nanowire 804.Accordingly, in embodiments having a plurality of nanowires 804, thesource or drain regions 810/812 of the nanowires are global or unifiedsource or drain regions as opposed to discrete for each nanowire. Thatis, the non-discrete source or drain regions 810/812 are global in thesense that a single unified feature is used as a source or drain regionfor a plurality (in this case, 3) of nanowires 804 and, moreparticularly, for more than one discrete channel region 806. In oneembodiment, from a cross-sectional perspective orthogonal to the lengthof the discrete channel regions 806, each of the pair of non-discretesource or drain regions 810/812 is approximately rectangular in shapewith a bottom tapered portion and a top vertex portion, as depicted inFIG. 8B. In other embodiments, however, the source or drain regions810/812 of the nanowires are relatively larger yet discretenon-vertically merged epitaxial structures such as nubs described inassociation with FIGS. 4A-4J.

In accordance with an embodiment of the present disclosure, and asdepicted in FIGS. 8A and 8B, integrated circuit structure 800 furtherincludes a pair of contacts 814, each contact 814 on one of the pair ofnon-discrete source or drain regions 810/812. In one such embodiment, ina vertical sense, each contact 814 completely surrounds the respectivenon-discrete source or drain region 810/812. In another aspect, theentire perimeter of the non-discrete source or drain regions 810/812 maynot be accessible for contact with contacts 814, and the contact 814thus only partially surrounds the non-discrete source or drain regions810/812, as depicted in FIG. 8B. In a contrasting embodiment, notdepicted, the entire perimeter of the non-discrete source or drainregions 810/812, as taken along the a-a′ axis, is surrounded by thecontacts 814.

Referring again to FIG. 8A, in an embodiment, integrated circuitstructure 800 further includes a pair of spacers 816. As is depicted,outer portions of the pair of spacers 816 may overlap portions of thenon-discrete source or drain regions 810/812, providing for “embedded”portions of the non-discrete source or drain regions 810/812 beneath thepair of spacers 816. As is also depicted, the embedded portions of thenon-discrete source or drain regions 810/812 may not extend beneath theentirety of the pair of spacers 816.

Substrate 802 may be composed of a material suitable for integratedcircuit structure fabrication. In one embodiment, substrate 802 includesa lower bulk substrate composed of a single crystal of a material whichmay include, but is not limited to, silicon, germanium,silicon-germanium, germanium-tin, silicon-germanium-tin, or a groupIII-V compound semiconductor material. An upper insulator layer composedof a material which may include, but is not limited to, silicon dioxide,silicon nitride or silicon oxy-nitride is on the lower bulk substrate.Thus, the structure 800 may be fabricated from a startingsemiconductor-on-insulator substrate. Alternatively, the structure 800is formed directly from a bulk substrate and local oxidation is used toform electrically insulative portions in place of the above describedupper insulator layer. In another alternative embodiment, the structure800 is formed directly from a bulk substrate and doping is used to formelectrically isolated active regions, such as nanowires, thereon. In onesuch embodiment, the first nanowire (i.e., proximate the substrate) isin the form of an omega-FET type structure.

In an embodiment, the nanowires 804 may be sized as wires or ribbons, asdescribed below, and may have squared-off or rounder corners. In anembodiment, the nanowires 804 are composed of a material such as, butnot limited to, silicon, germanium, or a combination thereof. In onesuch embodiment, the nanowires are single-crystalline. For example, fora silicon nanowire 804, a single-crystalline nanowire may be based froma (100) global orientation, e.g., with a <100> plane in the z-direction.As described below, other orientations may also be considered. In anembodiment, the dimensions of the nanowires 804, from a cross-sectionalperspective, are on the nano-scale. For example, in a specificembodiment, the smallest dimension of the nanowires 804 is less thanapproximately 20 nanometers. In an embodiment, the nanowires 804 arecomposed of a strained material, particularly in the channel regions806.

Referring to FIG. 8C, in an embodiment, each of the channel regions 806has a width (Wc) and a height (Hc), the width (Wc) approximately thesame as the height (Hc). That is, in both cases, the channel regions 806are square-like or, if corner-rounded, circle-like in cross-sectionprofile. In another aspect, the width and height of the channel regionneed not be the same, such as the case for nanoribbons as describedthroughout.

In an embodiment, as described throughout, an integrated circuitstructure includes non-planar devices such as, but not limited to, afinFET or a tri-gate device with corresponding one or more overlyingnanowire structures. In such an embodiment, a correspondingsemiconducting channel region is composed of or is formed in athree-dimensional body with one or more discrete nanowire channelportions overlying the three-dimensional body. In one such embodiment,the gate structures surround at least a top surface and a pair ofsidewalls of the three-dimensional body, and further surrounds each ofthe one or more discrete nanowire channel portions.

In an embodiment, the structure of FIGS. 8A-8C is formed using a commonmetal gate and a gate dielectric dipole layer approach, such asdescribed in association with FIGS. 1A, 1B, 2 and 3.

In an embodiment, as described throughout, an underlying substrate maybe composed of a semiconductor material that can withstand amanufacturing process and in which charge can migrate. In an embodiment,the substrate is a bulk substrate composed of a crystalline silicon,silicon/germanium or germanium layer doped with a charge carrier, suchas but not limited to phosphorus, arsenic, boron, gallium or acombination thereof, to form an active region. In one embodiment, theconcentration of silicon atoms in a bulk substrate is greater than 97%.In another embodiment, a bulk substrate is composed of an epitaxiallayer grown atop a distinct crystalline substrate, e.g. a siliconepitaxial layer grown atop a boron-doped bulk silicon mono-crystallinesubstrate. A bulk substrate may alternatively be composed of a groupIII-V material. In an embodiment, a bulk substrate is composed of agroup III-V material such as, but not limited to, gallium nitride,gallium phosphide, gallium arsenide, indium phosphide, indiumantimonide, indium gallium arsenide, aluminum gallium arsenide, indiumgallium phosphide, or a combination thereof. In one embodiment, a bulksubstrate is composed of a group III-V material and the charge-carrierdopant impurity atoms are ones such as, but not limited to, carbon,silicon, germanium, oxygen, sulfur, selenium or tellurium.

Embodiments disclosed herein may be used to manufacture a wide varietyof different types of integrated circuits and/or microelectronicdevices. Examples of such integrated circuits include, but are notlimited to, processors, chipset components, graphics processors, digitalsignal processors, micro-controllers, and the like. In otherembodiments, semiconductor memory may be manufactured. Moreover, theintegrated circuits or other microelectronic devices may be used in awide variety of electronic devices known in the arts. For example, incomputer systems (e.g., desktop, laptop, server), cellular phones,personal electronics, etc. The integrated circuits may be coupled with abus and other components in the systems. For example, a processor may becoupled by one or more buses to a memory, a chipset, etc. Each of theprocessor, the memory, and the chipset, may potentially be manufacturedusing the approaches disclosed herein.

FIG. 9 illustrates a computing device 900 in accordance with oneimplementation of an embodiment of the present disclosure. The computingdevice 900 houses a board 902. The board 902 may include a number ofcomponents, including but not limited to a processor 904 and at leastone communication chip 906. The processor 904 is physically andelectrically coupled to the board 902. In some implementations the atleast one communication chip 906 is also physically and electricallycoupled to the board 902. In further implementations, the communicationchip 906 is part of the processor 904.

Depending on its applications, computing device 900 may include othercomponents that may or may not be physically and electrically coupled tothe board 902. These other components include, but are not limited to,volatile memory (e.g., DRAM), non-volatile memory (e.g., ROM), flashmemory, a graphics processor, a digital signal processor, a cryptoprocessor, a chipset, an antenna, a display, a touchscreen display, atouchscreen controller, a battery, an audio codec, a video codec, apower amplifier, a global positioning system (GPS) device, a compass, anaccelerometer, a gyroscope, a speaker, a camera, and a mass storagedevice (such as hard disk drive, compact disk (CD), digital versatiledisk (DVD), and so forth).

The communication chip 906 enables wireless communications for thetransfer of data to and from the computing device 900. The term“wireless” and its derivatives may be used to describe circuits,devices, systems, methods, techniques, communications channels, etc.,that may communicate data through the use of modulated electromagneticradiation through a non-solid medium. The term does not imply that theassociated devices do not contain any wires, although in someembodiments they might not. The communication chip 906 may implement anyof a number of wireless standards or protocols, including but notlimited to Wi-Fi (IEEE 802.11 family), WiMAX (IEEE 802.16 family), IEEE802.20, long term evolution (LTE), Ev-DO, HSPA+, HSDPA+, HSUPA+, EDGE,GSM, GPRS, CDMA, TDMA, DECT, Bluetooth, derivatives thereof, as well asany other wireless protocols that are designated as 3G, 4G, 5G, andbeyond. The computing device 900 may include a plurality ofcommunication chips 906. For instance, a first communication chip 906may be dedicated to shorter range wireless communications such as Wi-Fiand Bluetooth and a second communication chip 906 may be dedicated tolonger range wireless communications such as GPS, EDGE, GPRS, CDMA,WiMAX, LTE, Ev-DO, and others.

The processor 904 of the computing device 900 includes an integratedcircuit die packaged within the processor 904. The integrated circuitdie of the processor 904 may include one or more structures, such asgate-all-around integrated circuit structures having common metal gatesand having gate dielectrics with a dipole layer, built in accordancewith implementations of embodiments of the present disclosure. The term“processor” may refer to any device or portion of a device thatprocesses electronic data from registers and/or memory to transform thatelectronic data into other electronic data that may be stored inregisters and/or memory.

The communication chip 906 also includes an integrated circuit diepackaged within the communication chip 906. The integrated circuit dieof the communication chip 906 may include one or more structures, suchas gate-all-around integrated circuit structures having common metalgates and having gate dielectrics with a dipole layer, built inaccordance with implementations of embodiments of the presentdisclosure.

In further implementations, another component housed within thecomputing device 900 may contain an integrated circuit die that includesone or structures, such as gate-all-around integrated circuit structureshaving common metal gates and having gate dielectrics with a dipolelayer, built in accordance with implementations of embodiments of thepresent disclosure.

In various implementations, the computing device 900 may be a laptop, anetbook, a notebook, an ultrabook, a smartphone, a tablet, a personaldigital assistant (PDA), an ultra mobile PC, a mobile phone, a desktopcomputer, a server, a printer, a scanner, a monitor, a set-top box, anentertainment control unit, a digital camera, a portable music player,or a digital video recorder. In further implementations, the computingdevice 900 may be any other electronic device that processes data.

FIG. 10 illustrates an interposer 1000 that includes one or moreembodiments of the present disclosure. The interposer 1000 is anintervening substrate used to bridge a first substrate 1002 to a secondsubstrate 1004. The first substrate 1002 may be, for instance, anintegrated circuit die. The second substrate 1004 may be, for instance,a memory module, a computer motherboard, or another integrated circuitdie. Generally, the purpose of an interposer 1000 is to spread aconnection to a wider pitch or to reroute a connection to a differentconnection. For example, an interposer 1000 may couple an integratedcircuit die to a ball grid array (BGA) 1006 that can subsequently becoupled to the second substrate 1004. In some embodiments, the first andsecond substrates 1002/1004 are attached to opposing sides of theinterposer 1000. In other embodiments, the first and second substrates1002/1004 are attached to the same side of the interposer 1000. And infurther embodiments, three or more substrates are interconnected by wayof the interposer 1000.

The interposer 1000 may be formed of an epoxy resin, afiberglass-reinforced epoxy resin, a ceramic material, or a polymermaterial such as polyimide. In further implementations, the interposer1000 may be formed of alternate rigid or flexible materials that mayinclude the same materials described above for use in a semiconductorsubstrate, such as silicon, germanium, and other group III-V and groupIV materials.

The interposer 1000 may include metal interconnects 1008 and vias 1010,including but not limited to through-silicon vias (TSVs) 1012. Theinterposer 1000 may further include embedded devices 1014, includingboth passive and active devices. Such devices include, but are notlimited to, capacitors, decoupling capacitors, resistors, inductors,fuses, diodes, transformers, sensors, and electrostatic discharge (ESD)devices. More complex devices such as radio-frequency (RF) devices,power amplifiers, power management devices, antennas, arrays, sensors,and MEMS devices may also be formed on the interposer 1000. Inaccordance with embodiments of the disclosure, apparatuses or processesdisclosed herein may be used in the fabrication of interposer 1000 or inthe fabrication of components included in the interposer 1000.

Thus, embodiments of the present disclosure include gate-all-aroundintegrated circuit structures having common metal gates and having gatedielectrics with a dipole layer, and methods of fabricatinggate-all-around integrated circuit structures having common metal gatesand having gate dielectrics with a dipole layer.

The above description of illustrated implementations of embodiments ofthe disclosure, including what is described in the Abstract, is notintended to be exhaustive or to limit the disclosure to the preciseforms disclosed. While specific implementations of, and examples for,the disclosure are described herein for illustrative purposes, variousequivalent modifications are possible within the scope of thedisclosure, as those skilled in the relevant art will recognize.

These modifications may be made to the disclosure in light of the abovedetailed description. The terms used in the following claims should notbe construed to limit the disclosure to the specific implementationsdisclosed in the specification and the claims. Rather, the scope of thedisclosure is to be determined entirely by the following claims, whichare to be construed in accordance with established doctrines of claiminterpretation.

Example embodiment 1: An integrated circuit structure includes a firstvertical arrangement of horizontal nanowires, and a second verticalarrangement of horizontal nanowires. A first gate stack is over thefirst vertical arrangement of horizontal nanowires, the first gate stacka PMOS gate stack having a P-type conductive layer on a first gatedielectric including a high-k dielectric layer on a first dipolematerial layer. A second gate stack is over the second verticalarrangement of horizontal nanowires, the second gate stack an NMOS gatestack having the P-type conductive layer on a second gate dielectricincluding the high-k dielectric layer on a second dipole material layer.

Example embodiment 2: The integrated circuit structure of exampleembodiment 1, wherein the high-k dielectric layer is an HfO₂ layer.

Example embodiment 3: The integrated circuit structure of exampleembodiment 1 or 2, wherein the first dipole layer includes a materialselected from the group consisting of Al₂O₃, TiO₂, ZrO₂, HfO₂, La₂O₃,Y₂O₃, MgO, SrO and Lu₂O₃, and the second dipole layer includes amaterial selected from the group consisting of Al₂O₃, TiO₂, ZrO₂, HfO₂,La₂O₃, Y₂O₃, MgO, SrO and Lu₂O₃.

Example embodiment 4: The integrated circuit structure of exampleembodiment 1, 2 or 3, wherein one of the first or the second dipolelayer has a thickness in the range of 1-3 Angstroms.

Example embodiment 5: The integrated circuit structure of exampleembodiment 1, 2, 3 or 4, wherein one of the first or the second dipolelayer has a thickness in the range of 4-6 Angstroms.

Example embodiment 6: The integrated circuit structure of exampleembodiment 1, 2, 3, 4 or 5, wherein the P-type conductive layer iscontinuous between the first gate stack and the second gate stack.

Example embodiment 7: The integrated circuit structure of exampleembodiment 1, 2, 3, 4, 5 or 6, further including a first pair ofepitaxial source or drain structures at first and second ends of thefirst vertical arrangement of horizontal nanowires, and a second pair ofepitaxial source or drain structures at first and second ends of thesecond vertical arrangement of horizontal nanowires.

Example embodiment 8: The integrated circuit structure of exampleembodiment 7, further including a first pair of conductive contacts onthe first pair of epitaxial source or drain structures, and a secondpair of conductive contacts on the second pair of epitaxial source ordrain structures.

Example embodiment 9: The integrated circuit structure of exampleembodiment 7 or 8, wherein the first and second pairs of epitaxialsource or drain structures are first and second pairs of non-discreteepitaxial source or drain structures.

Example embodiment 10: The integrated circuit structure of exampleembodiment 7 or 8, wherein the first and second pairs of epitaxialsource or drain structures are first and second pairs of discreteepitaxial source or drain structures.

Example embodiment 11: An integrated circuit structure includes a firstvertical arrangement of horizontal nanowires, a second verticalarrangement of horizontal nanowires, and a third vertical arrangement ofhorizontal nanowires. A first gate stack is over the first verticalarrangement of horizontal nanowires, the first gate stack a first NMOSgate stack having a P-type conductive layer on a first gate dielectricincluding a high-k dielectric layer on a first dipole material layer. Asecond gate stack is over the second vertical arrangement of horizontalnanowires, the second gate stack a second NMOS gate stack having theP-type conductive layer on a second gate dielectric including the high-kdielectric layer on a second dipole material layer. A third gate stackis over the second vertical arrangement of horizontal nanowires, thethird gate stack a third NMOS gate stack having the P-type conductivelayer on a third gate dielectric including the high-k dielectric layerand no dipole material layer.

Example embodiment 12: The integrated circuit structure of exampleembodiment 11, wherein the high-k dielectric layer is an HfO₂ layer.

Example embodiment 13: The integrated circuit structure of exampleembodiment 11 or 12, wherein the first and second dipole layers includea material selected from the group consisting of La₂O₃, Y₂O₃, MgO, SrOand Lu₂O₃.

Example embodiment 14: The integrated circuit structure of exampleembodiment 11, 12 or 13, wherein the P-type conductive layer iscontinuous between the first NMOS gate stack and the second NMOS gatestack, and is continuous between the second NMOS gate stack and thethird NMOS gate stack.

Example embodiment 15: The integrated circuit structure of exampleembodiment 11, 12, 13 or 14, wherein the first dipole layer has athickness in the range of 1-3 Angstroms, and the second dipole layer hasa thickness in the range of 4-6 Angstroms.

Example embodiment 16: A computing device includes a board, and acomponent coupled to the board. The component includes an integratedcircuit structure including a first vertical arrangement of horizontalnanowires, and a second vertical arrangement of horizontal nanowires. Afirst gate stack is over the first vertical arrangement of horizontalnanowires, the first gate stack a PMOS gate stack having a P-typeconductive layer on a first gate dielectric including a high-kdielectric layer on a first dipole material layer. A second gate stackis over the second vertical arrangement of horizontal nanowires, thesecond gate stack an NMOS gate stack having the P-type conductive layeron a second gate dielectric including the high-k dielectric layer on asecond dipole material layer.

Example embodiment 17: The computing device of example embodiment 16,further including a memory coupled to the board.

Example embodiment 18: The computing device of example embodiment 16 or17, further including a communication chip coupled to the board.

Example embodiment 19: The computing device of example embodiment 16, 17or 18, wherein the component is a packaged integrated circuit die.

Example embodiment 20: The computing device of example embodiment 16,17, 18 or 19, wherein the component is selected from the groupconsisting of a processor, a communications chip, and a digital signalprocessor.

What is claimed is:
 1. An integrated circuit structure, comprising: afirst vertical arrangement of horizontal nanowires; a second verticalarrangement of horizontal nanowires; a first gate stack over the firstvertical arrangement of horizontal nanowires, the first gate stack aPMOS gate stack having a P-type conductive layer on a first gatedielectric comprising a high-k dielectric layer on a first dipolematerial layer; and a second gate stack over the second verticalarrangement of horizontal nanowires, the second gate stack an NMOS gatestack having the P-type conductive layer on a second gate dielectriccomprising the high-k dielectric layer on a second dipole materiallayer.
 2. The integrated circuit structure of claim 1, wherein thehigh-k dielectric layer is an HfO₂ layer.
 3. The integrated circuitstructure of claim 1, wherein the first dipole layer comprises amaterial selected from the group consisting of Al₂O₃, TiO₂, ZrO₂, HfO₂,La₂O₃, Y₂O₃, MgO, SrO and Lu₂O₃, and the second dipole layer comprises amaterial selected from the group consisting of Al₂O₃, TiO₂, ZrO₂, HfO₂,La₂O₃, Y₂O₃, MgO, SrO and Lu₂O₃.
 4. The integrated circuit structure ofclaim 1, wherein one of the first or the second dipole layer has athickness in the range of 1-3 Angstroms.
 5. The integrated circuitstructure of claim 1, wherein one of the first or the second dipolelayer has a thickness in the range of 4-6 Angstroms.
 6. The integratedcircuit structure of claim 1, wherein the P-type conductive layer iscontinuous between the first gate stack and the second gate stack. 7.The integrated circuit structure of claim 1, further comprising: a firstpair of epitaxial source or drain structures at first and second ends ofthe first vertical arrangement of horizontal nanowires; and a secondpair of epitaxial source or drain structures at first and second ends ofthe second vertical arrangement of horizontal nanowires.
 8. Theintegrated circuit structure of claim 7, further comprising: a firstpair of conductive contacts on the first pair of epitaxial source ordrain structures; and a second pair of conductive contacts on the secondpair of epitaxial source or drain structures.
 9. The integrated circuitstructure of claim 7, wherein the first and second pairs of epitaxialsource or drain structures are first and second pairs of non-discreteepitaxial source or drain structures.
 10. The integrated circuitstructure of claim 7, wherein the first and second pairs of epitaxialsource or drain structures are first and second pairs of discreteepitaxial source or drain structures.
 11. An integrated circuitstructure, comprising: a first vertical arrangement of horizontalnanowires; a second vertical arrangement of horizontal nanowires; athird vertical arrangement of horizontal nanowires a first gate stackover the first vertical arrangement of horizontal nanowires, the firstgate stack a first NMOS gate stack having a P-type conductive layer on afirst gate dielectric comprising a high-k dielectric layer on a firstdipole material layer; a second gate stack over the second verticalarrangement of horizontal nanowires, the second gate stack a second NMOSgate stack having the P-type conductive layer on a second gatedielectric comprising the high-k dielectric layer on a second dipolematerial layer; and a third gate stack over the second verticalarrangement of horizontal nanowires, the third gate stack a third NMOSgate stack having the P-type conductive layer on a third gate dielectriccomprising the high-k dielectric layer and no dipole material layer. 12.The integrated circuit structure of claim 11, wherein the high-kdielectric layer is an HfO₂ layer.
 13. The integrated circuit structureof claim 11, wherein the first and second dipole layers comprise amaterial selected from the group consisting of La₂O₃, Y₂O₃, MgO, SrO andLu₂O₃.
 14. The integrated circuit structure of claim 11, wherein theP-type conductive layer is continuous between the first NMOS gate stackand the second NMOS gate stack, and is continuous between the secondNMOS gate stack and the third NMOS gate stack.
 15. The integratedcircuit structure of claim 11, wherein the first dipole layer has athickness in the range of 1-3 Angstroms, and wherein the second dipolelayer has a thickness in the range of 4-6 Angstroms.
 16. A computingdevice, comprising: a board; and a component coupled to the board, thecomponent including an integrated circuit structure, comprising: a firstvertical arrangement of horizontal nanowires; a second verticalarrangement of horizontal nanowires; a first gate stack over the firstvertical arrangement of horizontal nanowires, the first gate stack aPMOS gate stack having a P-type conductive layer on a first gatedielectric comprising a high-k dielectric layer on a first dipolematerial layer; and a second gate stack over the second verticalarrangement of horizontal nanowires, the second gate stack an NMOS gatestack having the P-type conductive layer on a second gate dielectriccomprising the high-k dielectric layer on a second dipole materiallayer.
 17. The computing device of claim 16, further comprising: amemory coupled to the board.
 18. The computing device of claim 16,further comprising: a communication chip coupled to the board.
 19. Thecomputing device of claim 16, wherein the component is a packagedintegrated circuit die.
 20. The computing device of claim 16, whereinthe component is selected from the group consisting of a processor, acommunications chip, and a digital signal processor.